1. TF - Long Run Plates in 0.28mm
2. SF - Medium Run Plates in 0.28mm
3. CtCP Plates
The base of material is uniformly grained and hard anodised, as well as resistant to cracking. These properties ensure minimal water requirement, good contrast after exposure and development, high corrosion and abrasion resistance of the non image areas and exceptionally high resistance to toning. On exposure the colour of P.S. coating changes, this produces a clearly visible image and excellent contrast, after development. Coating and base designed to avoid undercutting and halation. The light sensitivity of the plate is designed to provide large exposure latitude. Finally the ink receptivity of the plate is remarkable.
Plates can be processed either by hand, or by machine. Machine development is the most economical method and gives the highest guarantee for plate - to - plate consistency.
STORAGE AND HANDLING
P.S. Plates should be stored in the original, sealed package, and should be protected from temperature extremes. The preferred storage temperatures is between 20 and 30 C at a maximum relative humidity of 70%.
Remove only those plates that are to be used immediately, and reseal the package. We recommend the use of yellow light in the plate room. Direct light, bending and excessive mechanical stress should be avoided. The shelf life of the P.S. Plate stored and handled under proper conditions, is in excess of 1 year.
The maximum spectral sensitivity of the plate is in the near UV and visible region of 340 to 400 nm. Recommended exposure sources are metal halide lamps with high emission between 320 and 450 nm. All contact frames capable of maintaining complete vacuum contact between the film and plate during exposure can be used. For even illumination, the distance between the lamp and frame must be atleast equal to the plate diagonal, although a greater distance is preferable.
The recommended working temperature of both plate and developer is between 20 to 24 C. Higher temperature will shorten developing time and vice versa. Excessive developing temperatures in automatic processors and trays accelerates developer and decreases the footage yield. PSP developer is to be diluted 1:3 with water prior to actual use.
For manual development, the plate is placed on a smooth, level surface and sufficient developer is poured to enable the entire surface to be covered with the aid of an applicator. After 30seconds dwell- time, develop the plate, using horizontal and vertical motions of the applicator. After about one minute, squeezee the plate and repeat the procedure, using fresh developer. Development is completed when all the exposed coating has been removed.
After development, thoroughly rinse both sides of the plate, and squeezee.
The P.S. Plate can be developed in all processors with rotating or oscillating brushes.
PSP Developer should be used in 1:3 dilution with water. The recommended developer temperature is 20 to 24 C. Plate transport through the processor should be at a rate of 0.7 - 1.0 m/min.
After rinsing and squeezeeing, the plate must be gummed. For manual application, use Preserving Gum solution undiluted, for machine application, use Gum Solution P.S. For manual application we recommend that the plate be gummed on a clean, dry surface, and not in the developing tank. A modern, state of art gumming solution that assures quick roll-up without gum blinding.
To delete unwanted image areas from the exposed plate, apply PSP Image Remover. Application with a soft camel hair brush is recommended. To avoid sensitive edges, we recommend that corrections be made after gumming. Careful rinsing, squeezeeing and gumming is required after corrections have been made. Further fixing is not necessary.
PS Image Remover Pen